XAFS/XRF beamline is one of day-one beamlines constructed during the phase one beamlines at SESAME. This beamline is optimized for X-ray spectroscopic studies in all fields of science and for in situ studies of functional materials in particular. In terms of synchrotron equipment, the priority established by the objectives defined by the communities is x-ray absorption fine structure (XAFS) and x-ray fluorescence (XRF).
Most of the optics elements are retrieved from the ROBL beamline at ESRF. Within the beamline optics hutch, the white light is collimated by a double coated (Si and Pt) mirror (depending on the energy range), converted to a monochromatic beam by a double-crystal monochromator [Si(111) or Si(311)] running either in channel-cut or fixed-exit mode, and then vertically focused by a second mirror. Using a sagitally-focusing second crystal in the monochromator, and the vertically focusing mirror, a spot-size of about 0.4 x 0.4 mm2 can be achieved. With the energy range covered by the monochromator and the other optical components (4.5-30 keV), all the the K-edges elements ranging from Cr to Sn and the L-edges of elements ranging from Cs to Cm can be investigated.
|Energy range||4.5 - 30 keV|
|Flux on sample||~1011 ph/s/400 mA|
|Spot size on sample||~500 x 500 µm2|
|Intrinsic energy resolution (ΔE/E)|| 2.0 x 10-4 for Si(111)
1.0 x 10-4 for Si(311)